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FIZIKA A 2 (1993) 2, 71-78
 
SOME MAGNETIC AND MAGNETORESISTIVE PROPERTIES OF RF-SPUTTERED THIN
NiFe-Si FILMS
MARIA VATSKICHEVA, LYUDMIL VATSKICHEV, IVAN DIMITROV and BORISLAV KUNEV*
Faculty of Physics, Sofia University, 5 James Bourchier Blvd, Sofia 1126, Bulgaria
*Institute of Solid State Physics, 72 Tsarigradsko chaussé, Sofia 1784, Bulgaria
Received 2 January 1993
Revised manuscript received 4 May 1993
Original scientific paper
The galvanomagnetic properties and some structural peculiarities of rf-sputtered alloy
films (NI80Fe20)100-xSix at 0<x<30 at. % were studied and
compared with the corresponding properties of evaporated films of the same thickness and
composition. The content of silicon increased with the increasing of the velocity of
deposition and led to the amorphousation of the films. Coercivity decreased with the
velocity of growth but it did not depend on the thickness and on the velocity of film
deposition. The magnetoresistance ratio Dr/r of the
sputtered films was about three times higher then that of the evaporated films.
UDC 538.955
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