FIZIKA A 2 (1993) 1, 23-34

THERMAL STABILITY OF CV DEPOSITED TiO₂ THIN FILMS. XPS AND AES CHARACTERIZATION

ALEKSANDRA TURKOVIĆ, DAMIR ŠOKČEVIĆ
Ruđer Bošković Institute, P.O.B.1016, 41001 Zagreb, Croatia
TONICA VALLA, MILORAD MILUN
Institute of Physics of the University, P.O.B. 304, 41001 Zagreb, Croatia
and
JADRANKA RUKAVINA
Institute of TEŽ, Folnegovićeva 10, 41000 Zagreb, Croatia

Received 9 April 1993

Original scientific paper

Thermal stability of TiO₂ thin polycrystalline films obtained by the very simple chemical vapour deposition method on the quartz, molybdenum and gold substrates have been examined by X-ray photoelectron and Auger spectroscopy (XPS and AES), respectively, before and after annealing in vacuum at temperatures from 298 K to 1200 K. In this temperature range we have found carbon, water, and O-H groups as the impurities at the surface of the films. The possible influence of both the annealing and the impurities on the film stoichiometry is discussed.

UDC 538.971

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